SL4 Image Analysis Test Target

PURPOSE

This multi-pattern analysis slide is designed to support comprehensive evaluation of optical microscope systems. It incorporates a diverse range of pattern types—including dot arrays, line gratings, grid structures, angular scales, and variable density fields—to facilitate detailed inspection and calibration of contrast, focus, alignment, spatial resolution, and field distortion. Both darkfield and brightfield imaging modes are supported. This slide is especially useful in laboratory QA, optics development, image system benchmarking, and comparative analysis across multiple microscopy platforms.

CONFIGURATION

• Material: Soda Lime Glass
• Pattern: Low Reflective Chrome
• Size: Nominal 3" × 1" / 75 × 25 mm
• Thickness: 0.060" (1.5 mm)

PATTERN DESCRIPTION

• Dot Array: 250 µm dots on 500 µm centre-to-centre pitch
• Variable Pitch Line Gratings: 20 µm line, 100 µm pitch; 10 µm line, 100 µm pitch; 3 µm line, 10 µm pitch
• Grid Array: 8 µm line, 100 µm pitch with inset finer grid at 50 µm pitch
• Grid Array: 20 µm line, 500 µm pitch with inset finer grid at 250 µm pitch
• Protractor: 20 µm lines on 30° centre-to-centre pitch
• Fixed Line Grating: 10 µm line on 20 µm pitch
• Fixed Line Grating: 40 µm line on 80 µm pitch
• Concentric Squares: 20 µm line, 100 µm centre-to-centre
• Concentric Circles: 20 µm line, 100 µm centre-to-centre
• Adjacent Circles: Array of dots from 4 µm to 3.5 mm, with decreasing gap spacing
• Adjacent Squares: Array of squares from 4 µm to 3.5 mm, with decreasing gap spacing

Low-resolution PDF previews of the pattern are available in the DOWNLOAD tab.

BASE MATERIAL

Standard products are produced on soda lime glass with a low reflective chrome pattern applied to the surface. The chrome features a top CrO layer to reduce unwanted reflectivity. Alternative substrates, such as Fused Silica (Quartz) or film, are available on request.

TURNAROUND

Standard production turnaround is 5 working days from order receipt. Accelerated services are available for urgent requirements.

INSPECTION

All photomasks undergo a comprehensive inspection process. Key parameters such as Critical Dimension (CD) and feature uniformity are measured and recorded. High-magnification images (Nikon MM40 at 900×, OGP ZIP 300 at 400×) are stored with production data. For sectors requiring compliance documentation—such as medical or automotive—optional inspection certificates can be included with the order.

Standard: Full inspection performed; no documentation supplied.

Certificate of Conformance: Confirms compliance with internal inspection standards.

Certificate of Measurement: Selected pattern features are measured and recorded per standard tolerances. Documentation provided with the target. Additional measurements available upon request.

Please see the TECHNICAL, DOWNLOAD, and FAQ sections for further information. If you still require clarification, please either email or click for LIVE SUPPORT.