Sub Micron Photomasks

Ultra High Resolution Photomasks designed for applications requiring critical dimensions from 0.6 µm to 1.0 µm. Produced using high-resolution chrome-on-glass processes to ensure dimensional accuracy, uniformity, and edge sharpness. Suitable for advanced optical, MEMS, and microfabrication applications. Customers can specify the required CD and tolerance to meet specific process needs. Refer to product specifications for detailed options and guidance.