Chrome on glass photomasks are designed for high-precision pattern transfer, offering high accuracy, sharp edge definition, and excellent dimensional stability. Manufactured on optical-grade quartz or soda-lime glass, these masks feature a sputtered chrome layer patterned through photolithography to achieve critical feature tolerances. With resolutions down to 1µm or finer, they are used in semiconductor lithography, microfluidics, MEMS fabrication, and diffraction optics. Surface quality, line edge roughness, and critical dimension uniformity are tightly controlled to ensure consistent and reliable performance. Various substrate thicknesses and reflectivity coatings are available to suit specific application requirements.
Low Reflective Chrome Photomask (LRC)
12" x 12" (L x W x D)
304mm x 304mm
Low Reflective Chrome Photomask (LRC)
17" x 14" (L x W )
430mm x 355mm
Low Reflective Chrome Photomask (LRC)
24" x 20" (L x W)
609mm x 508mm
Low Reflective Chrome Photomask (LRC)
24" x 24" (L x W)
609mm x 609mm
Low Reflective Chrome Photomask (LRC)
28" x 24" (L x W)
711mm x 609mm
Low Reflective Chrome Photomask (LRC)
32" x 24" (L x W)
812mm x 609mm