Photomasks
Our Photomask production service offers high precision at an excellent price-to-performance ratio. We manufacture chrome on glass and emulsion film photomasks with resolutions down to 1µm or finer, ensuring sharp edge definition, sub-micron alignment accuracy, and minimal feature distortion. Whether for semiconductors, microfluidics, MEMS, diffraction optics, or PCB production, our masks deliver the accuracy required for demanding applications—without the high costs typically associated with such precision. With multiple resolution options, fast turnaround times, and custom fabrication capabilities, we offer a flexible and cost-effective solution for your photomask needs. Explore our range or contact us for bespoke specifications.
Products
Chrome on glass photomasks are designed for high-precision pattern transfer, offering high accuracy, sharp edge definition, and excellent dimens...
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Emulsion film photomasks provide a cost-effective solution for pattern transfer in applications where critical accuracy is not necessary but hig...
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Ultra High Resolution Photomasks designed for applications requiring critical dimensions from 0.6 µm to 1.0 µm. Produced using high-resolution...
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Dithered greyscale photomasks simulate varying grey levels using binary halftone patterns such as Jarvis or checkerboard dithering. By patternin...
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