SL10 Exposure Pattern Test Target

PURPOSE

This resolution test pattern is designed for comprehensive evaluation of optical systems and image sensors. Its combination of line pairs, concentric rectangles, and circles allows precise analysis of spatial resolution, directional sensitivity, and contrast response. The inclusion of both normal and inverted polarities makes this a versatile calibration tool suitable for camera setup, exposure control, lithographic process checks, and QA benchmarking.

KEY TECHNICAL FEATURES

1. Geometric Feature Set: Includes line pairs, concentric rectangles, and circles for detailed optical evaluation.
2. Rotated Pattern: Full 90° duplication enables directional sensitivity checks.
3. Negative Duplication: Complete pattern repeated in inverted polarity for contrast verification and exposure balance.
4. Micron-Scale Resolution: Line pair range from 5 µm to 35 µm, with optional high-resolution variants down to 1 µm.
5. High-Resolution Versions: SL10-1 and SL10-2 extend resolution to 1 µm in either dark (chrome) or clear (glass) polarities.
6. Durable Chrome on Glass: Manufactured on low-reflective CrOx-coated soda lime glass for repeatable performance and long-term use.

CONFIGURATION

• Material: Soda Lime Glass
• Pattern: Low Reflective Chrome
• Size: 3" x 3" (76 mm x 76 mm)
• Thickness: 1.5 mm (0.060")

PATTERN DESCRIPTION

The pattern includes reducing line/space features from 100 µm down to 5 µm, duplicated at 90° rotation. Concentric circles are drawn with 10 µm and 5 µm line/space widths. Concentric rectangles reduce from 200 µm to 5 µm lines. The entire layout is then duplicated in negative polarity for contrast calibration.

A special high-resolution version is available with extended resolution from 5 µm down to 1 µm. These ultra-fine features are supplied in a single polarity only (dark or clear). When ordering, please specify:

• SL10: Standard pattern
• SL10-1: High resolution with 1 µm clear (glass) lines
• SL10-2: High resolution with 1 µm dark (chrome) lines

Low-resolution pattern previews can be downloaded from the DOWNLOAD section.

BASE MATERIAL

These targets are produced on soda lime glass, patterned with low reflective chrome. The chrome is oxidized (CrOx) to reduce glare and surface reflections. Alternative substrates such as fused silica or film are available upon request.

TURNAROUND

Standard production time is 5 working days from order receipt. Accelerated options may be available for urgent projects.

INSPECTION

All photomasks undergo a comprehensive inspection process. Key parameters such as Critical Dimension (CD) and feature uniformity are measured and recorded. High-magnification images (Nikon MM40 at 900×, OGP ZIP 300 at 400×) are stored with production data. For sectors requiring compliance documentation—such as medical or automotive—optional inspection certificates can be included with the order.

Standard: Full inspection performed; no documentation supplied.

Certificate of Conformance: Confirms compliance with internal inspection standards.

Certificate of Measurement: Up to 10 line/space dimensions (width and pitch) can be measured and documented. CAD or marked drawing may be required. Additional measurements available on request.

Please see the TECHNICAL, DOWNLOAD, and FAQ sections for further information. If you still require clarification, please either email or click for LIVE SUPPORT.