9" Chrome Photomask
GB £646.00
Low Reflective Chrome Photomask (LRC)
9" x 9" (L x W )
228mm x 228mm
Availability:
In stock
SKU
H09-LC-SL
BASE MATERIAL
Supplied on soda lime glass with a low-reflective chrome pattern etched on the surface. The top chrome layer includes an oxide (CrO) coating to minimise light reflection. Quartz is also available as a substrate, with other materials offered by special order. See SPECIFICATIONS for further details.
CHOOSING RESOLUTIONS
Masks can be written at four resolution levels, referred to as "classes." Higher classes offer increased quality. Each class improvement delivers a 2× enhancement in addressability, minimum line size, edge roughness, CD uniformity, and alignment accuracy. Refer to the SPECIFICATIONS tab for information on dimensional accuracy and tolerance impacts.
Certain geometries, such as 15 µm triangles, contain apexes that cannot be rendered with full precision. Higher resolution classes reduce this rounding effect. This also applies to features with sharp corners. For critical shapes, select the highest class that meets your budget.
Edge sharpness, especially for arcs, depends on addressability and edge roughness. For improved edge quality, choose a higher class.
Class 1: For non-critical designs. Possibe pixelation visible on arcs and diagonals.
Class 2: Suitable for features ≥4 µm. Good edge definition with moderate pixelation.
Class 3: Balanced cost and performance. Resolves 2 µm features with sharp edges.
Class 4: Highest resolution. Supports 1 µm features with high precision.
MIN CD
CD (Critical Dimension) refers to the smallest printed feature, including both lines and spaces. Accurate CD data allows selection of suitable inspection and manufacturing methods. Use the NOTES field for additional information.
CAD FORMAT
Supported formats: Gerber, GDSII, DXF, CIF, and others. Formats such as CorelDraw, PDF, or SVG may introduce micron-level errors and are not recommended for Class 3 or 4. Contact us for assistance with unsupported formats. Full drafting services available from drawings or specifications.
 |
POLARITY Masks are specified as Clearfield (positive) or Darkfield (negative). In Clearfield, the CAD data is chrome on clear glass. In Darkfield, the data is clear and the background is chrome. Include reference text and specify whether it should be right-reading or wrong-reading to define orientation. Need further clarification? See our instructional video here... |
PRODUCTION SCHEDULE
Standard turnaround is 3–4 days from receipt of artwork, order, and documentation. A checkplot is provided for approval before manufacturing.
Standard (4 days): Default lead time, subject to workload. Checkplot provided within 4 hours. Orders received after 1:00pm start next day.
2 Days: Priority service. Complete order must be received by 11:00am. Checkplot expected within 1 hour.
Sameday: Express service. Complete order by 9:30am. Not available for Class 4. Checkplot issued within 30 minutes.
8 Days: Reduced-cost non-urgent service.
INSPECTION
All photomasks are subject to a rigorous inspection process, regardless of the selected inspection class. Critical parameters such as CD (Critical Dimension) size and uniformity are measured and recorded internally. High-magnification images are captured using Nikon MM40 (900×) and OGP ZIP 300 (400×) systems, and stored with our production records. In some industries—particularly medical or automotive—additional inspection documentation may be required for compliance with quality systems. You can select the level of documentation to be provided with your order.Standard: Full inspection performed; no documentation issued.
Certificate of Conformance: Printed certificate confirming compliance with inspection criteria.
Certificate of Measurement: Verifies up to 10 user-defined dimensions against specified tolerances. A CAD file or drawing must be provided indicating the positions to be measured. Additional measurements available on request.
CHECKPLOT
Before production, we supply a checkplot—an essential part of our approval workflow. This checkplot is a high resolution PDF graphic, emailed to you for review. It provides an overview of the design layout, helping you confirm pattern alignment, feature placement, and polarity. However, it is a rasterised image and not suitable for verifying precise dimensions.
For critical designs where dimensional accuracy must be confirmed at the CAD level, we recommend using our online CAD checkplot viewer. This platform allows you to inspect your design using vector data, ensuring that features such as linewidth and spacing match your expectations. You can zoom in to inspect fine details, toggle layers, and therefore compare your submitted file against our interpreted version.
Checkplot approval is mandatory before manufacturing begins. No production will start until confirmation is received. Ensure that your review includes polarity, reading direction, and any reference markers required by your process.
For more details, see our Checkplot Information Page.
YOUR DRAWING NUMBER
Specify the CAD filename or drawing number for correct data matching.
NOTES
Use this section to include any special instructions or order-specific requirements.
Please refer to the TECHNICAL, DOWNLOAD, and FAQ sections for additional details. For assistance, contact us by email or LIVE SUPPORT.
| Specification | BASE MATERIAL
COATING
RESOLUTIONS AND ACCURACY |
||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| FAQ | FAQ's Q: What is the smallest feature that you can produce? Q: How accurate are the features? What tolerances do you work to? Q: What resolution should I choose? Q: What does the term "Polarity" mean? Q: I’ve designed my mask with the wrong polarity—what should I do? Q: What is Right Reading, Wrong Reading, and Mirrored? Q: What does 'Negative Data – Right Reading Chrome Down' actually mean? Q: What file formats do you accept? Q: What is your standard lead time? Q: How should I clean the photomask? Q: Can I reorder the same mask later? Q: Can you produce masks from hand drawings or image files? Q: Can the same photomask be used multiple times? |
||||||||||||
| Downloads |
|
Material Specifications
General
Product Specifications
BASE MATERIAL
COATING
RESOLUTIONS AND ACCURACY
FAQ's
Q: What is the smallest feature that you can produce?
A: This depends on several factors: the imaging resolution, the base material, the polarity of the mask, and the feature type (e.g., spot, square, line). As a general guide, we can consistently produce 1–2 µm features. With careful process control, we can achieve 1 µm or below in select cases.
Q: How accurate are the features? What tolerances do you work to?
A: Tolerances are resolution-dependent. Our QUICK REFERENCE guide provides a detailed chart of feature and dimensional tolerances by resolution class.
Q: What resolution should I choose?
A: Higher resolution improves edge definition, reduces feature rounding, allows smaller minimum feature sizes, and produces smoother curves and corners. The difference may be subtle or significant depending on your design. If unsure, selecting a higher resolution provides more margin. We’re happy to advise—send us your design database for review.
Q: What does the term "Polarity" mean?
A: Polarity refers to the tone of the photomask—commonly described as Positive (Clearfield) or Negative (Darkfield). In practical terms, it defines whether the features you draw are chrome (opaque) or clear (transparent) on the final mask. This refers to the mask pattern, not the wafer polarity in lithographic processes.
Q: I’ve designed my mask with the wrong polarity—what should I do?
A: We can invert the tone directly from your original design file. There’s no need to supply revised data—just let us know.
Q: What is Right Reading, Wrong Reading, and Mirrored?
A: These terms describe orientation. For photolithography, "Right Reading Chrome Down" means the chrome side is face down (toward the wafer) and the text/design reads correctly. "Wrong Reading" typically refers to a mirrored image. For optical components, "Right Reading Chrome Up" is more common. Always include reference text in your layout and specify your preferred orientation on the order form.
Q: What does 'Negative Data – Right Reading Chrome Down' actually mean?
A: This means that when the photomask is held with the chrome side down and the glass side up, the design reads correctly. However, the pattern will be the inverse (negative) of the data originally drawn in your file.
Q: What file formats do you accept?
A: We accept industry-standard CAD formats such as Gerber, GDSII, DXF, and CIF. For higher-resolution photomasks (Class 3 or 4), we do not recommend design files exported from graphic or publishing software (e.g., CorelDraw, PDF, or SVG), as these can introduce micron-scale inaccuracies. Contact us if your format is not listed—we offer full conversion and drafting services.
Q: What is your standard lead time?
A: Standard production lead time is 4 working days from receipt of artwork, order, and checkplot approval. Expedited services are available for 2-day and same-day turnaround, depending on the complexity and resolution class. Longer lead times apply for non-urgent discounted services.
Q: How should I clean the photomask?
A: Use clean, lint-free gloves when handling the photomask. For general cleaning, apply filtered deionised water or isopropyl alcohol with a soft, non-abrasive tissue. Do not use compressed air containing oil or debris. Avoid contact with hard objects that may scratch the chrome surface.
Q: Can I reorder the same mask later?
A: Yes. We archive all production data, including CAD files and inspection records, for repeatability. To reorder, reference your previous order number or drawing ID. We will confirm that no changes are required before production.
Q: Can you produce masks from hand drawings or image files?
A: Yes. We offer a full drafting service and can convert sketches, image files (TIFF, BMP, JPG), and annotated PDFs into production-ready CAD data. Additional setup time and charges may apply based on complexity.
Q: Can the same photomask be used multiple times?
A: Yes, provided it is handled correctly and stored in a clean, static-free environment. Reuse depends on your exposure process, resist type, and cleaning method. If used in contact lithography, take care to avoid damage from wafer contact and resist residues.