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Sub Micron Resolution Photomasks

GB £809.00

Low Reflective Chrome Photomask (LRC)
Quartz material 0.09"
5" x 5"

Made to Order

SKU
H05-SUBUM

Maximum 200 characters

Maximum 500 characters

BASE MATERIAL

Supplied on Quartz glass with a low-reflective chrome pattern etched on the surface. The top chrome layer includes an oxide (CrO) coating to minimise light reflection. 

 

CHOOSING RESOLUTIONS

Masks in this range are written at a fixed high resolution, suitable for critical dimensions between 0.6 µm and 1.0 µm. Instead of selecting a resolution class, customers can specify the Critical Dimension (CD) and Tolerance that meet their application requirements.

Select the nearest band BELOW your requirements. For example, if you require 0.85 +/- 0.01 then select 0.8 instead.

 

MIN CD

CD (Critical Dimension) refers to the smallest printed feature, including both lines and spaces. Accurate CD data allows selection of suitable inspection and manufacturing methods. Use the NOTES field for additional information.

 

CAD FORMAT

Supported formats: Gerber, GDSII, DXF, CIF, and others. Formats such as CorelDraw, PDF, or SVG may introduce micron-level errors and are not recommended . Contact us for assistance with unsupported formats. Full drafting services available from drawings or specifications.

Glass Photomask Polarity

POLARITY

Masks are specified as Clearfield (positive) or Darkfield (negative).

In Clearfield, the CAD data is chrome on clear glass. In Darkfield, the data is clear and the background is chrome.

Include reference text and specify whether it should be right-reading or wrong-reading to define orientation.

Need further clarification? See our instructional video here...

 

PRODUCTION SCHEDULE

Due to the complexity and challenging aspect of creating sub micron photomasks, our Standard turnaround is 14 days from receipt of artwork, order, and documentation. 

Standard 14 days: Default lead time, subject to workload. Checkplot provided within 4 hours. 

7 Days: Priority service. 

 

 

INSPECTION

All photomasks are subject to a rigorous inspection process, regardless of the selected inspection class. Critical parameters such as CD (Critical Dimension) size and uniformity are measured and recorded internally. High-magnification images are captured using Nikon MM40 (900×) and OGP ZIP 300 (400×) systems, and stored with our production records. In some industries—particularly medical or automotive—additional inspection documentation may be required for compliance with quality systems. You can select the level of documentation to be provided with your order. 

Standard: Full inspection performed; no documentation issued.

Certificate of Conformance: Printed certificate confirming compliance with inspection criteria.

Certificate of Measurement: Verifies up to 10 user-defined dimensions against specified tolerances. A CAD file or drawing must be provided indicating the positions to be measured. Additional measurements available on request.

 

CHECKPLOT

Before production, we supply a checkplot—an essential part of our approval workflow. This checkplot is a high resolution PDF graphic, emailed to you for review. It provides an overview of the design layout, helping you confirm pattern alignment, feature placement, and polarity. However, it is a rasterised image and not suitable for verifying precise dimensions.

 

For critical designs where dimensional accuracy must be confirmed at the CAD level, we recommend using our online CAD checkplot viewer. This platform allows you to inspect your design using vector data, ensuring that features such as linewidth and spacing match your expectations. You can zoom in to inspect fine details, toggle layers, and therefore compare your submitted file against our interpreted version.

 

Checkplot approval is mandatory before manufacturing begins. No production will start until confirmation is received. Ensure that your review includes polarity, reading direction, and any reference markers required by your process.

 

For more details, see our Checkplot Information Page.

 

YOUR DRAWING NUMBER

Specify the CAD filename or drawing number for correct data matching.

 

NOTES

Use this section to include any special instructions or order-specific requirements.

 

 

Please refer to the TECHNICAL, DOWNLOAD, and FAQ sections for additional details. For assistance, contact us by email or LIVE SUPPORT.

More Information
Specification
FAQ

FAQ's

Q: What is the smallest feature size available on this photomask?
A: This photomask range supports critical dimensions (CD) down to 0.6 µm. Customers can select from a range of CDs between 0.6 µm and 1.5 µm depending on their application requirements.

Q: How do I select the correct tolerance?
A: Tolerances are application-specific. Tighter tolerances (e.g., ±0.05 µm) provide more precise dimensional control but may increase cost and lead time. All available CD and tolerance combinations are shown in the product table—select the one that matches your critical requirements.

Q: What resolution class do I need for this mask?
A: This mask is written at a fixed high resolution that supports all the listed CDs and tolerances. There is no need to select a resolution class—simply choose your CD and tolerance combination.

Q: What materials and coatings are used?
A: The mask is fabricated using high-quality chrome on soda lime glass. Standard film stack is our low reflectivity chrome system (Cr + CrOx) designed for optical clarity and durability.

Q: Can I specify polarity, orientation, and alignment marks?
A: Yes. You can select Positive (Clearfield) or Negative (Darkfield) polarity, and specify orientation such as Right Reading Chrome Down or Chrome Up. Alignment marks can be added as required—please include details with your CAD file or request assistance from our team.

Q: What file formats are accepted for this mask?
A: We accept Gerber, GDSII, DXF, and CIF formats. If you only have an image or sketch, we can convert it for you through our drafting service.

Q: What is the typical lead time for this product?
A: Standard production lead time is 4 working days after order, artwork, and checkplot approval. Faster delivery may be possible—contact us for availability.

Q: Can I reorder the same mask later?
A: Yes. All production data is archived for repeatability. To reorder, reference your previous order or drawing number and we will confirm all details before manufacture.

Q: How do I clean and store the photomask?
A: Handle only with lint-free gloves. Clean using filtered deionised water or isopropyl alcohol and soft tissue. Store in a clean, static-free container to avoid contamination and physical damage.

Downloads

 

PDF Download

How To Order Photomasks

 

 

 

PDF Download

Designing Your Photomask - a Guide

 

 

 

PDF Download

Material Specifications for standard photomasks

 

 

 

PDF Download

Dimensional Stability of Film v Glass photomasks

 

 

 

PDF Download

Photomasks - The Complete Guide

 

 

 

PDF Download

Quality Assurance Certificate

 

FAQ's

Q: What is the smallest feature size available on this photomask?
A: This photomask range supports critical dimensions (CD) down to 0.6 µm. Customers can select from a range of CDs between 0.6 µm and 1.5 µm depending on their application requirements.

Q: How do I select the correct tolerance?
A: Tolerances are application-specific. Tighter tolerances (e.g., ±0.05 µm) provide more precise dimensional control but may increase cost and lead time. All available CD and tolerance combinations are shown in the product table—select the one that matches your critical requirements.

Q: What resolution class do I need for this mask?
A: This mask is written at a fixed high resolution that supports all the listed CDs and tolerances. There is no need to select a resolution class—simply choose your CD and tolerance combination.

Q: What materials and coatings are used?
A: The mask is fabricated using high-quality chrome on soda lime glass. Standard film stack is our low reflectivity chrome system (Cr + CrOx) designed for optical clarity and durability.

Q: Can I specify polarity, orientation, and alignment marks?
A: Yes. You can select Positive (Clearfield) or Negative (Darkfield) polarity, and specify orientation such as Right Reading Chrome Down or Chrome Up. Alignment marks can be added as required—please include details with your CAD file or request assistance from our team.

Q: What file formats are accepted for this mask?
A: We accept Gerber, GDSII, DXF, and CIF formats. If you only have an image or sketch, we can convert it for you through our drafting service.

Q: What is the typical lead time for this product?
A: Standard production lead time is 4 working days after order, artwork, and checkplot approval. Faster delivery may be possible—contact us for availability.

Q: Can I reorder the same mask later?
A: Yes. All production data is archived for repeatability. To reorder, reference your previous order or drawing number and we will confirm all details before manufacture.

Q: How do I clean and store the photomask?
A: Handle only with lint-free gloves. Clean using filtered deionised water or isopropyl alcohol and soft tissue. Store in a clean, static-free container to avoid contamination and physical damage.